
Contact
Email:
choffman@technion.ac.il
Office Phone:
+972-77-887-3747
Office Location:
#466, Chemistry Faculty
Alon Hoffman
Faculty
Quantum area: Quantum sensing
Chemistry Faculty
Education
1987 D.Sc. Physics Department, Technion – Israel Institute of Technology, Israel.
1982 B.A. (Cum Laude) Physics Department, Technion – Israel Institute of Technology, Israel.
Research Interests
- Physico-chemical processes and properties of surfaces.
- Electron, photon, ion and thermal stimulated processes on surfaces: ESD, SEE, QPY, TPD and IEEE.
- Electron spectroscopy (EELS, XPS, AES, UPS, HREELS, NEXAFS) of carbon allotropes surfaces.
- Nucleation and growth processes and mechanism of poly- and nano-crystalline diamond films.
- Diamond growth onto WC-Co and ferrous substrates using special CrN interlayers
- Interaction of hydrogen with single crystal, poly- and nano- crystalline diamond surfaces: content, bonding and thermal stability.
- Properties of III-V semiconductor and Cu-Al surfaces.
Research group members