X-Ray Photoelectron Spectroscopy (XPS)

Contact: Dr. Kamira Cohen-Weinfeld

Tel: +972- 4-829-5638 / 3421

e-mail: kamiraw@technion.ac.il

Scanning (XPS) microprobe VersaProbe III (PHI, USA) system installed in 2017, at Surface Science Lab.

XPS provides very precise quantitative chemical composition of solid surfaces (0.1at. % precision) and information about chemical environment for different kind of surfaces (thin layers, interfaces, bulk, nanoparticles and powder materials). Dual Beam Neutralization system assures removal of static charges at the surface allowing analysis of non-conductive samples.

Key features are:

- An Aluminum monochromated (Al Kα 1486.6 eV) X-Ray primary source with a beam size from 10m up to 200 m.

- Scanning X-Ray Secondary Electron Imaging (SXI) for features localization with a FOV up to 700*700m2

- Surface sensitivity: probes top 2 - 8nm of the material

- Chemical bonding information from core level energy shifts

- Chemical State Imaging and Mapping of sample surface (lateral resolution ~5m)

- Depth profiling by monoatomic Argon Ion Sputtering with a 3nm depth resolution

- Non -destructive depth profiling by Angle Resolved -XPS (ARXPS), till 15nm from top surface

- Soft Depth profile by Cluster Ar3000+ Ion Gun Sputtering

- Electronic structure information by XPS analysis

- Ultra Violet Photoelectron Spectroscopy (UPS) analysis for a direct measurement of Valence Band and Work Function of materials

- In situ sample cooling (down to -140°C) or heating (up to 800°C).